alumina zinc oxide sputtering target High density, high even, sputtering process is stability,provide bonding services. alumina zinc oxide sputtering target1,the purity is more than 99.99% ,,2,the relative density is more than 99%.The size is as following:The plate sputtering...

AZO sputtering target High density, high even, low electric resistance, sputtering process is stability AZO sputtering target the purity is more than 99.99% ,the relative density is more than 99%.The size is as following:The plate sputtering target:all size within...

AZO rotary target High density, high even, low electric resistance, sputtering process is stability AZO rotary targetthe purity is more than 99.99% ,the relative density is more than 99%.The size is as following:The plate sputtering target:all size within 600*300mm*20mmThe...

AZO rotatable target High density, high even, low electric resistance, sputtering process is stability AZO rotatable  targetthe purity is more than 99.99%the relative density is more than 98%.The size is as following:The plate sputtering target:all size within...

AZO rotary sputtering target High density, high even low electric resistance sputtering process is stability provide bondin AZO rotary sputtering target 1,the purity is more than 99.99%2,the relative density is more than 98%.3,The size is as following:The plate...

AZO rotary target High density, high even, low electric resistance, sputtering process is stability AZO rotary target1,the purity is more than 99.99%,2,the relative density is more than 99%.The size is as following:The plate sputtering target:3,all size within 600*300mm*20mmThe...

AZO rotary target High density, high even, low electric resistance, sputtering process is stability AZO rotary target the purity is more than 99.99%the relative density is more than 99%.The size is as following:The plate sputtering target:all size within...

ZnO-Al sputtering target High density, high even low electric resistance sputtering process is stability, provide bonding ZnO-Al sputtering targetthe purity is more than 99.99%the relative density is more than 98%.The size is as following:The plate sputtering target:all size...

ZnO-Al sputtering target High density, high even, low electric resistance, sputtering process is stability ZnO-Al sputtering target:1,the purity is more than 99.99%,2,the relative density is more than 98%.The size is as following:The plate sputtering target:3,all size within...

AZO rotatable sputtering target Sputtering target made by Balen means:high density, high even, low electric resistance, the AZO rotatable sputtering targetSputtering target made by Balen have following characteristics:the purity is more than 99.99% ,the relative density is...