AZO sputtering target High density, high even, low electric resistance, sputtering process is stability AZO sputtering target the purity is more than 99.99% ,the relative density is more than 99%.The size is as following:The plate sputtering target:all size within...

AZO rotary sputtering target High density, high even low electric resistance sputtering process is stability provide bondin AZO rotary sputtering target 1,the purity is more than 99.99%2,the relative density is more than 98%.3,The size is as following:The plate...

AZO rotary target High density, high even, low electric resistance, sputtering process is stability AZO rotary target the purity is more than 99.99%the relative density is more than 99%.The size is as following:The plate sputtering target:all size within...

ZnO-Al sputtering target High density, high even low electric resistance sputtering process is stability, provide bonding ZnO-Al sputtering targetthe purity is more than 99.99%the relative density is more than 98%.The size is as following:The plate sputtering target:all size...

AZO rotatable sputtering target Sputtering target made by Balen means:high density, high even, low electric resistance, the AZO rotatable sputtering targetSputtering target made by Balen have following characteristics:the purity is more than 99.99% ,the relative density is...

AZO-S target Special design of AZO-S target materials, It have better stability to various environment.High density, high eve AZO-S targetGreen colourthe purity is more than 99.99% ,the relative density is more than 99%.The size is as following:The plate sputtering target:all...